In the photolithography process, wafers can be exposed to wet chemical baths to remove layers of deposited films or harden photoresist. Temperature control is critical in these processes to control the rate of reaction, etch, etc.

Because of the chemicals used, it is sometimes desired to have a Teflon coated temperature probes. These coatings can be applied onto the probe as a thin film or a thick jacket. The Teflon can be standard grade or ultra-pure. These probes are available as either a thermocouple or RTD.

Probe coating will reduce the response time of the probe. There are several things that can be done to offset this reduction in response if response time is critical including minimizing the diameter and changing the internal construction of the probe. Contact Conax to discuss the constraints of your specific application.

Teflon® is a registered trademark of E.I DuPont de Nemours Company.