Ion Implantation is a critical step in the manufacture of semiconductors. To remove atoms from the accelerated ion's path, a vacuum is pulled within the tool. High energy implantation can heat the wafer and cause problems that lead to yield reduction. Monitoring the temperature of wafers during implantation is required to determine the amount of wafer cooling that is required.

The above Conax vacuum seal shows cooling lines and instrumentation wires passing through a pressure boundary. Conax Semiconductor can easily customize a feedthrough to accommodate the amount of wires, tubes, electrodes and probes that you need to seal on. The seals utilize a "soft sealant" technology that allows you to loosen the gland, replace a wire, etc., and retorque to return the system to a vacuum-ready condition.